Tripp Families of North America

Family: Floyd Benjamin Chase / Lepha L Millis (F49854)

m. 1880


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  • Male
    Floyd Benjamin Chase

    Birth  July 1857  Edmeston, Otsego, New York, USA Find all individuals with events at this location
    Death  28 December 1934  Burlington, Otsego, New York, USA Find all individuals with events at this location
    Burial    Burlington Flats, Otsego, New York, USA Find all individuals with events at this location
    Marriage  1880  [1]  New York, USA  [1] Find all individuals with events at this location
    Father  Benjamin Chase, Jr | F13056 Group Sheet 
    Mother  Eliza Ann Tripp | F13056 Group Sheet 

    Female
    Lepha L Millis

    Birth  4 January 1862  Burlington, Otsego, New York, USA Find all individuals with events at this location
    Death  July 1940  Burlington Flats, Otsego, New York, USA Find all individuals with events at this location
    Burial    Burlington Flats, Otsego, New York, USA Find all individuals with events at this location
    Father  William L Millis | F49463 Group Sheet 
    Mother  Harriet Neff | F49463 Group Sheet 

    Male
    Lynn DeForest Chase

    Birth  2 February 1881  North Edmeston, Otsego County, New York, USA Find all individuals with events at this location
    Death  1962   
    Burial    Burlington Flats, Otsego, New York, USA Find all individuals with events at this location
    Spouse  Elvira Ann Parker | F1200 
    Marriage     

    Female
    Lena Mae Chase

    Birth  14 June 1883  Otsego County, New York, USA Find all individuals with events at this location
    Death  15 February 1924  Utica, Oneida, New York, USA Find all individuals with events at this location
    Burial    Burlington Flats, Otsego, New York, USA Find all individuals with events at this location
    Spouse  Ray E Fitch | F49510 
    Marriage     

  • Sources 
    1. [S1250923625] Ancestry.com, 1900 United States Federal Census, (Ancestry.com Operations Inc), Year: 1900; Census Place: Burlington, Otsego, New York; Roll: 1145; Page: 13; Enumeration District: 0109; FHL microfilm: 1241145.